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Semiconductor wafer automatic cleaning machine
Semiconductor wafer automatic cleaning machine
Product details
The goal of wafer cleaning is to ensure purity is maintained without altering or damaging the surface or substrate of the wafer. Taking a semiconductor company as an example:
According to the cleaning requirements of the enterprise, a fixed cleaning system is configured for the wafer requirements to achieve automatic cleaning function.
① Silicon chip cleaning is equipped with a rotating nozzle made of PTFE material, which is temperature resistant and corrosion-resistant. It is also equipped with flange interfaces and fixing rods made of the same material. Model: DN12~DN20
② Circulating reflux solvent function, using a pump set to supply pressure at 0.5-3 bar, with non-metallic materials such as PTFE as the pump flow components, ensuring that the cleaning solution does not come into contact with metals and that there are no metal ions detected in the cleaning solution.
③ Process: Rotate and spray clean the DN series can washer, start the cleaning pump first during cleaning, and clean for the set time; While cleaning, discharge the cleaning solution, open the corresponding reflux solenoid valve of the cleaning agent, filter it through the reflux pump, and then store it in the solvent tank.
④ Control: Explosion proof electrical box is used for explosion-proof treatment, with explosion-proof grade BT4, touch screen display, and operation buttons for function selection. All motors, solenoid valves, and other electronic control components are uniformly controlled by an electrical control box, with reserved cable interfaces for functional expansion.
3D drawing of wafer cleaning equipment
3D drawing of wafer cleaning equipment

Physical picture of wafer cleaning equipment

Layout of wafer cleaning equipment

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